Recent training-free layout-to-image diffusion models have demonstrated remarkable performance in generating high-quality images with controllable layouts. These models follow a one-stage framework: Encouraging the model to focus the attention map of each concept on its corresponding region by defining attention map-based losses. However, these models still struggle to accurately follow layouts with significant overlap, often leading to issues like attribute leakage and missing entities. In this paper, we propose ToLo, a two-stage, training-free layout-to-image generation framework for high-overlap layouts. Our framework consists of two stages: the aggregation stage and the separation stage, each with its own loss function based on the attention map. To provide a more effective evaluation, we partition the HRS dataset based on the Intersection over Union (IoU) of the input layouts, creating a new dataset for layout-to-image generation with varying levels of overlap. Through extensive experiments on this dataset, we demonstrate that ToLo significantly enhances the performance of existing methods when dealing with high-overlap layouts. Our code and dataset are available here:this https URL.
View on arXiv@article{huang2025_2503.01667,
title={ ToLo: A Two-Stage, Training-Free Layout-To-Image Generation Framework For High-Overlap Layouts },
author={ Linhao Huang and Jing Yu },
journal={arXiv preprint arXiv:2503.01667},
year={ 2025 }
}