MAGIC: Mask-Guided Diffusion Inpainting with Multi-Level Perturbations and Context-Aware Alignment for Few-Shot Anomaly Generation

Few-shot anomaly generation is emerging as a practical solution for augmenting the scarce anomaly data in industrial quality control settings. An ideal generator would meet three demands at once, namely (i) keep the normal background intact, (ii) inpaint anomalous regions to tightly overlap with the corresponding anomaly masks, and (iii) generate anomalous regions in a semantically valid location, while still producing realistic, diverse appearances from only a handful of real examples. Existing diffusion-based methods usually satisfy at most two of these requirements: global anomaly generators corrupt the background, whereas mask-guided ones often falter when the mask is imprecise or misplaced. We propose MAGIC--Mask-guided inpainting with multi-level perturbations and Context-aware alignment--to resolve all three issues. At its core, MAGIC fine-tunes a Stable Diffusion inpainting backbone that preserves normal regions and ensures strict adherence of the synthesized anomaly to the supplied mask, directly addressing background corruption and misalignment. To offset the diversity loss that fine-tuning can cause, MAGIC adds two complementary perturbation strategies: (i) Gaussian prompt-level perturbation applied during fine-tuning and inference that broadens the global appearance of anomalies while avoiding low-fidelity textual appearances, and (ii) mask-guided spatial noise injection that enriches local texture variations. Additionally, the context-aware mask alignment module forms semantic correspondences and relocates masks so that every anomaly remains plausibly contained within the host object, eliminating out-of-boundary artifacts. Under a consistent identical evaluation protocol on the MVTec-AD dataset, MAGIC outperforms previous state-of-the-arts in downstream anomaly tasks.

@article{choi2025_2507.02314,
  title={ MAGIC: Mask-Guided Diffusion Inpainting with Multi-Level Perturbations and Context-Aware Alignment for Few-Shot Anomaly Generation },
  author={ JaeHyuck Choi and MinJun Kim and JeHyeong Hong },
  journal={arXiv preprint arXiv:2507.02314},
  year={ 2025 }
}